Evanescent near-field optical lithography : overcoming the diffraction limit : a thesis presented for the degree of Doctor of Philosophy in Electrical and Electronic Engineering at the University of Canterbury, Christchurch, New Zealand / Sharee J. McNab.

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Détails bibliographiques
Publié:	[2001]
Accès en ligne:	Connect to electronic version
Auteur principal:	McNab, Sharee J. (Sharee Jane)
Sujets:	Photolithography. Resolution (Optics) Masks (Electronics) Microfabrication.
Format:	Thèse Livre

$Evanescent near-field optical lithography : overcoming the diffraction limit : a thesis presented for the degree of Doctor of Philosophy in Electrical and Electronic Engineering at the University of Canterbury, Christchurch, New Zealand /$

Description
Description matérielle:	xxvi, 196 p. : ill. (some col.) ; 30 cm.
Notes:	Typescript (photocopy). "5 March 2001." Thesis (Ph. D.)--University of Canterbury, 2001. Bib#: 769396
Bibliographie:	Includes bibliographical references (p. [185]-196).
Langue:	English
Bib#:	769396

Evanescent near-field optical lithography : overcoming the diffraction limit : a thesis presented for the degree of Doctor of Philosophy in Electrical and Electronic Engineering at the University of Canterbury, Christchurch, New Zealand / Sharee J. McNab.

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