Evanescent near-field optical lithography : overcoming the diffraction limit : a thesis presented for the degree of Doctor of Philosophy in Electrical and Electronic Engineering at the University of Canterbury, Christchurch, New Zealand / Sharee J. McNab.

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht: [2001]
Online Zugang:
1. Verfasser:
McNab, Sharee J. (Sharee Jane)
Schlagworte:
Photolithography.
Resolution (Optics)
Masks (Electronics)
Microfabrication.
Format: Abschlussarbeit Buch
Evanescent near-field optical lithography : overcoming the diffraction limit : a thesis presented for the degree of Doctor of Philosophy in Electrical and Electronic Engineering at the University of Canterbury, Christchurch, New Zealand /
Beschreibung
Beschreibung:xxvi, 196 p. : ill. (some col.) ; 30 cm.
Anmerkungen:Typescript (photocopy).
"5 March 2001."
Thesis (Ph. D.)--University of Canterbury, 2001.
Bib#: 769396
Bibliographie:Includes bibliographical references (p. [185]-196).
Sprache:English
Bib#:769396

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