Evanescent near-field optical lithography : overcoming the diffraction limit : a thesis presented for the degree of Doctor of Philosophy in Electrical and Electronic Engineering at the University of Canterbury, Christchurch, New Zealand / Sharee J. McNab.

অনুরূপ উপাদানগুলি

• Distortion in conformable masks for evanescent near field optical lithography : a thesis submitted in partial fulfilment of the requirements for the degree of Master of Engineering in Electrical and Computer Engineering, University of Canterbury, Christchurch, New Zealand /
  অনুযায়ী: Wright, A. J. (Alan James)
  প্রকাশিত: (2007)
• EUV lithography /
  প্রকাশিত: (2009)
• Planar lensing lithography : enhancing the optical near field : a thesis presented for the degree of Doctor of Philosophy in Electrical and Electronic Engineering at the University of Canterbury, Christchurch, New Zealand /
  অনুযায়ী: Melville, David O. S. (David Osmond Scott)
  প্রকাশিত: (2006)
• Design of an interference lithography system : a thesis submitted in partial fulfilment of the requirements for the degree of Master of Engineering in Electrical and Electronic Engineering at the University of Canterbury, Christchurch, New Zealand /
  অনুযায়ী: Drake, Stephen J. (Stephen Joseph)
  প্রকাশিত: (2005)
• Absorbance modulation optical lithography : simulating the performance of an adaptable absorbance mask in the near-field : a thesis presented for the degree of Doctor of Philosophy in Electrical and Electronic Engineering at the University of Canterbury, Christchurch, New Zealand /
  অনুযায়ী: Foulkes, John, 1985-
  প্রকাশিত: (2010)