Nanolithography using reactive ion etched silicon nitride phase shifting masks : a thesis submitted in partial fulfilment of the requirements for the degree of Master of Engineering in Electrical and Electronic Engineering at the University of Canterbury, Christchurch, New Zealand / Huoguang Chen.
Saved in:
出版: |
[2000]
|
---|---|
主要作者: | |
主題: | |
格式: | Thesis 圖書 |
Macmillan Brown Library Storage, Thesis Collection, Request for use in MB Library
索引號
復印件
Loan Type
狀態
預訂
|
|||||
EPS Library, Level 3
索引號
復印件
Loan Type
狀態
預訂
|
|||||