Growth mechanism of aluminium oxide films and factors controlling it in a pulse pressure MOCVD deposition technique using different precursors in organic solvents : a thesis submitted in partial fulfilment of the requirements for the degree of Doctor of Philosophy in Mechanical Engineering at the University of Canterbury, Christchurch, New Zealand / by Hari Murthy.

समान संसाधन

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• Mist chemical vapour deposition of tin oxide thin films and nanostructures : a thesis submitted in fulfillment of the requirements for the degree of Doctor of Philosophy in the School of Physical and Chemical Sciences /
  द्वारा: Scott, Jonty
  प्रकाशित: (2019)