Process and device modeling / edited by W.L. Engl.
Saved in:
| Published: |
Amsterdam ; New York : New York, N.Y., U.S.A. :
North-Holland ; Sole distributors for the U.S.A. and Canada, Elsevier Science Pub. Co.,
1986.
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| Other Authors: | |
| Series: | Advances in CAD for VLSI ;
v. 1 |
| Subjects: | |
| Format: | Book |
EPS Library, Level 3
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