Characterisation of magnetic ion implanted ZnO materials /

ā- Kennedy, J. V. (John Vedamuthu)
I whakaputaina 2008

Characterisation of the first series of ZnO thin films produced by ion beam sputtering technique /

ā- Kennedy, J. V. (John Vedamuthu)
I whakaputaina 2007

Diffusion of Sn in (100) Si under electron beam annealing following dual implantations Sn/Si, Sn/Ne, Sn/C, Sn/N /

ā- Darfeuille, Lise
I whakaputaina 2012

The formation of novel nanostructures using a combination of Si, N, C implantation into wafer silicon and glassy carbon on the SiC-Si₃N₄ tie-line /

ā- Carder, D. A.
I whakaputaina 2009

High current electron emission from novel semiconductor nanocrystals and related nanostructures /

ā- Carder, D. A.
I whakaputaina 2008

Implantation of acceptor ions into ZnO crystals /

ā- Kennedy, J. V. (John Vedamuthu)
I whakaputaina 2006

Introduction to SIMION 7.0 /

ā- Leveneur, Jérôme
I whakaputaina 2008

Ion transport simulations /

ā- Leveneur, Jérôme
I whakaputaina 2008

Medium energy ion scattering (MEIS) /

ā- Dittmann, K. (Katja)
I whakaputaina 2009

Nuclear reaction analysis of nanomaterials : analysis of implanted and annealed samples with NRA and resonant-NRA /

ā- Toutain, F.
I whakaputaina 2012

Operation of low-energy ion implanters for Si, N, C, ion implantation into silicon and glassy carbon /

ā- Carder, D. A.
I whakaputaina 2009

Operation of the 'Frankfurt' electron beam annealer for annealing of implanted materials /

ā- Carder, D. A.
I whakaputaina 2009

Protocol for magnetic ion implantation into zinc oxide /

ā- Kennedy, J. V. (John Vedamuthu)
I whakaputaina 2008

The triple beam line : in-situ RBS, EBA and ion implantation /

ā- Lohde, J.
I whakaputaina 2012