Characterisation of magnetic ion implanted ZnO materials /

per Kennedy, J. V. (John Vedamuthu)
Publicat 2008

Characterisation of the first series of ZnO thin films produced by ion beam sputtering technique /

per Kennedy, J. V. (John Vedamuthu)
Publicat 2007

Diffusion of Sn in (100) Si under electron beam annealing following dual implantations Sn/Si, Sn/Ne, Sn/C, Sn/N /

per Darfeuille, Lise
Publicat 2012

The formation of novel nanostructures using a combination of Si, N, C implantation into wafer silicon and glassy carbon on the SiC-Si₃N₄ tie-line /

per Carder, D. A.
Publicat 2009

High current electron emission from novel semiconductor nanocrystals and related nanostructures /

per Carder, D. A.
Publicat 2008

Implantation of acceptor ions into ZnO crystals /

per Kennedy, J. V. (John Vedamuthu)
Publicat 2006

Introduction to SIMION 7.0 /

per Leveneur, Jérôme
Publicat 2008

Ion transport simulations /

per Leveneur, Jérôme
Publicat 2008

Medium energy ion scattering (MEIS) /

per Dittmann, K. (Katja)
Publicat 2009

Nuclear reaction analysis of nanomaterials : analysis of implanted and annealed samples with NRA and resonant-NRA /

per Toutain, F.
Publicat 2012

Operation of low-energy ion implanters for Si, N, C, ion implantation into silicon and glassy carbon /

per Carder, D. A.
Publicat 2009

Operation of the 'Frankfurt' electron beam annealer for annealing of implanted materials /

per Carder, D. A.
Publicat 2009

Protocol for magnetic ion implantation into zinc oxide /

per Kennedy, J. V. (John Vedamuthu)
Publicat 2008

The triple beam line : in-situ RBS, EBA and ion implantation /

per Lohde, J.
Publicat 2012