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  1. 1
    “...QC 702.7 .I55 .K35 i 2006...”
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    Implantation of acceptor ions into ZnO crystals /
  2. 2
    by Carder, D. A.
    Published 2009
    “...QC 702.7 .I55 .C266 2009...”
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    The formation of novel nanostructures using a combination of Si, N, C implantation into wafer silicon and glassy carbon on the SiC-Si₃N₄ tie-line /
  3. 3
    by Carder, D. A.
    Published 2009
    “...QC 702.7 .I55 .C266 o 2009...”
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    Operation of low-energy ion implanters for Si, N, C, ion implantation into silicon and glassy carbon /
  4. 4
    “...QC 702.7 .B65 .K35 c 2008...”
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    Characterisation of magnetic ion implanted ZnO materials /
  5. 5
    by Carder, D. A.
    Published 2009
    “...QC 702.7 .I55 .C266 of 2009...”
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    Operation of the 'Frankfurt' electron beam annealer for annealing of implanted materials /
  6. 6
    by Toutain, F.
    Published 2012
    “...QC 702.7 .I55 .T736 2012...”
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    Nuclear reaction analysis of nanomaterials : analysis of implanted and annealed samples with NRA and resonant-NRA /
  7. 7
    by Darfeuille, Lise
    Published 2012
    “...QC 702.7 .I55 .D217 2012...”
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    Diffusion of Sn in (100) Si under electron beam annealing following dual implantations Sn/Si, Sn/Ne, Sn/C, Sn/N /
  8. 8
    by Lohde, J.
    Published 2012
    “...QC 702.7 .I55 .L833 2012...”
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    The triple beam line : in-situ RBS, EBA and ion implantation /
  9. 9
    by Leveneur, Jérôme
    Published 2008
    “...QC 702.7 .I55 .L657 2010...”
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    Ion transport simulations /

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