Emerging lithographic technologies XII : 26-28 February 2008, San Jose, California, USA / Frank M. Schellenberg, editor ; sponsored by SPIE ; cooperating organization, SEMATECH (USA).

Wedi'i Gadw mewn:
Manylion Llyfryddiaeth
Cyhoeddwyd: Bellingham, Wash. : SPIE, c2008.
Awduron Corfforaethol:
Awduron Eraill:
Cyfres:Proceedings of SPIE--the International Society for Optical Engineering ; v. 6921.
Pynciau:
Fformat: Llyfr

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