Emerging lithographic technologies XII : 26-28 February 2008, San Jose, California, USA / Frank M. Schellenberg, editor ; sponsored by SPIE ; cooperating organization, SEMATECH (USA).

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书目详细资料
出版:	Bellingham, Wash. : SPIE, c2008.
企业作者:	Society of Photo-optical Instrumentation Engineers International SEMATECH
其他作者:	Schellenberg, F. M., 1959-
丛编:	Proceedings of SPIE--the International Society for Optical Engineering ; v. 6921.
主题:	Lithography, Electron beam > Congresses. Microlithography > Industrial applications > Congresses. X-ray lithography > Congresses. X-rays > Industrial applications > Congresses. Masks (Electronics) > Congresses.
格式:	图书

Emerging lithographic technologies XII : 26-28 February 2008, San Jose, California, USA /

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