Emerging lithographic technologies XII : 26-28 February 2008, San Jose, California, USA / Frank M. Schellenberg, editor ; sponsored by SPIE ; cooperating organization, SEMATECH (USA).

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Опубликовано:	Bellingham, Wash. : SPIE, c2008.
Корпоративные авторы:	Society of Photo-optical Instrumentation Engineers International SEMATECH
Другие авторы:	Schellenberg, F. M., 1959-
Серии:	Proceedings of SPIE--the International Society for Optical Engineering ; v. 6921.
Предметы:	Lithography, Electron beam > Congresses. Microlithography > Industrial applications > Congresses. X-ray lithography > Congresses. X-rays > Industrial applications > Congresses. Masks (Electronics) > Congresses.
Формат:	‌

Emerging lithographic technologies XII : 26-28 February 2008, San Jose, California, USA /

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