Emerging lithographic technologies XII : 26-28 February 2008, San Jose, California, USA / Frank M. Schellenberg, editor ; sponsored by SPIE ; cooperating organization, SEMATECH (USA).
Պահպանված է:
Հրապարակվել է: |
Bellingham, Wash. :
SPIE,
c2008.
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Համատեղ հեղինակներ: | |
Այլ հեղինակներ: | |
Շարք: | Proceedings of SPIE--the International Society for Optical Engineering ;
v. 6921. |
Խորագրեր: | |
Ձևաչափ: | Գիրք |
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Proceedings of the 5th conference on X-ray analytical methods.
Հրապարակվել է: (1966)