Emerging lithographic technologies XII : 26-28 February 2008, San Jose, California, USA / Frank M. Schellenberg, editor ; sponsored by SPIE ; cooperating organization, SEMATECH (USA).

में बचाया:

ग्रंथसूची विवरण
प्रकाशित:	Bellingham, Wash. : SPIE, c2008.
निगमित लेखकों:	Society of Photo-optical Instrumentation Engineers International SEMATECH
अन्य लेखक:	Schellenberg, F. M., 1959-
श्रृंखला:	Proceedings of SPIE--the International Society for Optical Engineering ; v. 6921.
विषय:	Lithography, Electron beam > Congresses. Microlithography > Industrial applications > Congresses. X-ray lithography > Congresses. X-rays > Industrial applications > Congresses. Masks (Electronics) > Congresses.
स्वरूप:	पुस्तक

Emerging lithographic technologies XII : 26-28 February 2008, San Jose, California, USA /

समान संसाधन

Optical microlithography XXI : 26-29 February 2008, San Jose, California, USA /
प्रकाशित: (2008)

Nanostructure engineering by means of nanoimprint lithography : a thesis submitted in partial fulfilment of the requirements for the degree of Master of Engineering in Electrical and Electronic Engineering in the University of Canterbury /
द्वारा: Jayatissa, C. A. N. Wasantha (Canangama Arachchige Nandan Wasantha)
प्रकाशित: (2003)

Resist deformation in nanoimprint lithography : a thesis submitted in partial fulfillment of the requirements for the degree of Master of Engineering in the Electrical and Computer Engineering at the University of Canterbury /
द्वारा: Mohamed, Khairudin
प्रकाशित: (2005)

Multilevel nanoengineering for imprint lithography : a thesis submitted in partial fulfilment of the requirements for the degree of Master of Engineering in Electrical and Electronic Engineering at the University of Canterbury, Christchurch, New Zealand /
द्वारा: Konijn, Mark
प्रकाशित: (2005)

Proceedings of the 5th conference on X-ray analytical methods.
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Mathematical theory of X-ray powder diffractometry.
द्वारा: Wilson, A. J. C. (Arthur James Cochran), 1914-
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A further handbook of industrial radiology /
द्वारा: Wiltshire, W. J.
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Handbook of industrial radiology, by members of the Industrial radiology group of the Institute of Physics /
द्वारा: Crowther, James Arnold, b. 1883
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Distortion in conformable masks for evanescent near field optical lithography : a thesis submitted in partial fulfilment of the requirements for the degree of Master of Engineering in Electrical and Computer Engineering, University of Canterbury, Christchurch, New Zealand /
द्वारा: Wright, A. J. (Alan James)
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Handbook on radiographic apparatus and techniques /
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X-ray metallography.
द्वारा: Taylor, Abraham
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Absorbance modulation optical lithography : simulating the performance of an adaptable absorbance mask in the near-field : a thesis presented for the degree of Doctor of Philosophy in Electrical and Electronic Engineering at the University of Canterbury, Christchurch, New Zealand /
द्वारा: Foulkes, John, 1985-
प्रकाशित: (2010)

Residual stress measurement by x-ray diffraction : SAE J7849 /
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An introduction to X-ray metallography /
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X-ray analysers in process control /
द्वारा: Carr-Brion, K.
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Photomask and X-ray mask technology : 22 April 1994, Kawasaki City, Kanagawa, Japan /
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X-ray stress measurement by the back-reflection camera technique : a thesis presented for the degree of Master of Engineering in Mechanical Engineering in the University of Canterbury, Christchurch, New Zealand /
द्वारा: Rutledge, A. L. (Anthony Leonard)
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Feasibility of DEXA prediction of dry matter and mass for horticultural products /
द्वारा: Bartle, C. Murray (Colin Murray)
प्रकाशित: (2009)

Advances in resist materials and processing technology XXV : 25-27 February 2008, San Jose, California, USA /
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X- and gamma-ray astronomy /
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Nanolithography using reactive ion etched silicon nitride phase shifting masks : a thesis submitted in partial fulfilment of the requirements for the degree of Master of Engineering in Electrical and Electronic Engineering at the University of Canterbury, Christchurch, New Zealand /
द्वारा: Chen, Huoguang
प्रकाशित: (2000)

Examining the submicron world /
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X-ray spectrometry in electron beam instruments /
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The discovery of the electron : the development of the atomic concept of electricity.
द्वारा: Anderson, David L., 1946-
प्रकाशित: (1964)

Advances in X-ray diffractometry and X-ray spectrography : a volume of fifteen selected reprints from Philips Laboratories, Irvington-on-Hudson, New York, U.S.A. /
द्वारा: Parrish, William, 1914-
प्रकाशित: (1962)

X-ray microscopy and microradiography : proceedings /
प्रकाशित: (1957)

Diffraction methods /
द्वारा: Wormald, John Roger
प्रकाशित: (1973)

Crystals and X-rays.
द्वारा: Lonsdale, Kathleen, Dame, 1903-1971
प्रकाशित: (1948)

Fundamental principles of optical lithography : the science of microfabrication /
द्वारा: Mack, Chris A.
प्रकाशित: (2007)

X-ray microanalysis in the electron microscope /
द्वारा: Chandler, John A.
प्रकाशित: (1977)

X-ray and electron diffraction studies in materials science /
द्वारा: Dyson, D. J. (David John)
प्रकाशित: (2004)

X-ray spectroscopy related to the determination of electron-capture ratios /
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Supernova remnants and their X-ray emission : symposium no. 101, held in Venice, Italy, 30 August-2 September 1982 /
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2nd AINSE Symposium on Neutron Scattering : powder diffraction ; Associated meeting Australian Neutron Beam Users Group ; symposium handbook.
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High resolution X-ray spectroscopy of cosmic plasmas : the proceedings of International Astronomical Union 115th Colloquium /
प्रकाशित: (1990)

X-ray diffraction : [By] Leonid V. Azaroff [and others].
प्रकाशित: (1974)

X-ray physics and equipment /
द्वारा: Jaundrell-Thompson, Fred
प्रकाशित: (1970)

The interpretation of X-ray diffraction photographs /
द्वारा: Henry, N. F. M. (Norman Fordyce McKerron)
प्रकाशित: (1953)

Single crystal diffractometry /
द्वारा: Arndt, U. W.
प्रकाशित: (1966)

Anomalous X-ray scattering for materials characterization : atomic-scale structure determination /
द्वारा: Waseda, Yoshio
प्रकाशित: (2002)