Emerging lithographic technologies XII : 26-28 February 2008, San Jose, California, USA / Frank M. Schellenberg, editor ; sponsored by SPIE ; cooperating organization, SEMATECH (USA).
Gardado en:
| Publicado: |
Bellingham, Wash. :
SPIE,
c2008.
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| Corporate Authors: | |
| Outros autores: | |
| Series: | Proceedings of SPIE--the International Society for Optical Engineering ;
v. 6921. |
| Subjects: | |
| Formato: | Libro |
