Emerging lithographic technologies XII : 26-28 February 2008, San Jose, California, USA / Frank M. Schellenberg, editor ; sponsored by SPIE ; cooperating organization, SEMATECH (USA).

مواد مشابهة

• Optical microlithography XXI : 26-29 February 2008, San Jose, California, USA /
  منشور في: (2008)
• Nanostructure engineering by means of nanoimprint lithography : a thesis submitted in partial fulfilment of the requirements for the degree of Master of Engineering in Electrical and Electronic Engineering in the University of Canterbury /
  حسب: Jayatissa, C. A. N. Wasantha (Canangama Arachchige Nandan Wasantha)
  منشور في: (2003)
• Resist deformation in nanoimprint lithography : a thesis submitted in partial fulfillment of the requirements for the degree of Master of Engineering in the Electrical and Computer Engineering at the University of Canterbury /
  حسب: Mohamed, Khairudin
  منشور في: (2005)
• Multilevel nanoengineering for imprint lithography : a thesis submitted in partial fulfilment of the requirements for the degree of Master of Engineering in Electrical and Electronic Engineering at the University of Canterbury, Christchurch, New Zealand /
  حسب: Konijn, Mark
  منشور في: (2005)
• Proceedings of the 5th conference on X-ray analytical methods.
  منشور في: (1966)